SIC பூசப்பட்ட MOCVD SUSSCECTOR

Veteksemicon's MOCVD Epitaxial Susceptors are designed to withstand high temperature environments and harsh chemical conditions common in the wafer production process. Through precision engineering, these components are tailored to meet the stringent requirements of epitaxial reactor systems. 

Our MOCVD Epitaxial Susceptors are made of high-quality graphite substrates coated with a layer of silicon carbide (SiC), which not only has excellent high temperature and corrosion resistance, but also ensures uniform heat distribution, which is critical to maintaining consistent epitaxial film deposition.

In addition, our semiconductor susceptors have excellent thermal performance, which allows for fast and uniform temperature control to optimize the semiconductor growth process. They are able to withstand the attack of high temperature, oxidation, and corrosion, ensuring reliable operation even in the most challenging operating environments.

In addition, the Silicon Carbide Coating MOCVD Susceptors are designed with a focus on uniformity, which is critical to achieving high-quality single crystal substrates. The achievement of flatness is essential to achieve excellent single crystal growth on the wafer surface.

At Veteksemicon, our passion for exceeding industry standards is as important as our commitment to cost-effectiveness for our partners. We strive to provide products such as the MOCVD Epitaxial Susceptor to meet the ever-changing needs of semiconductor manufacturing and anticipate its development trends to ensure your operation is equipped with the most advanced tools. We look forward to building a long-term partnership with you and providing you with quality solutions.